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  • Ceramic Substrate Cleaner

Ceramic Substrate Cleaner

Model : SMC04

SMC04 is applied to the cleaning test of gallium nitride quartz parts

Before cleaning: GaN with a tight structure after vapor deposition is attached to the quartz surface. It cannot be sprayed off by high-pressure water gun cleaning. It cannot be wiped off with red pickle cloth.

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Soak and clean with SMC04 at 60degC: Water heating is required. Do not put SMC04 in stainless steel or glass containers, because free metal ions will accelerate the deterioration of SMC04. Therefore, it is recommended to put it in a plastic container and heat it with water。

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After cleaning: GaN is loosened from the quartz surface after soaking in SMC04 heated to 60°C for 30 minutes. At this time, it can be easily removed by spraying with a high-pressure water jet, or with a white/red pickle cloth.

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Ceramic substrate cleaner CSC01 and silicon dioxide thin film cleaner SMC04 are applied to the cleaning test of quartz parts

  1. before cleaning(0sec)

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  2. After soaking for 3 hours at 60~65℃ with silicon dioxide film cleaning agent SMC04, the transparent film on the surface has been decomposed.

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  3. After washing with water, soak with ceramic substrate cleaner CSC01 at 60~65°C for 30 minutes, then take it out and scrub it under water.

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    Soak for 1 minute. Some of the brown deposits have come off.

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    Zoom in to see.

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    After soaking for 30 minutes. The brown deposits have mostly dissolved.

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    Zoom in to see.

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    Scrub under clean water.

  4. After washing with water, soak in silicon dioxide film cleaning agent SMC04 to completely decompose the translucent film on the surface.

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  5. There are two types of attachments on quartz parts.

    Recommended cleaning method:
    SMC04 -> CSC01 -> SMC04
    or use
    CSC01 -> SMC04 -> CSC01
    Should be completely washable.




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